EEN Offer - Unique plasma-process monitoring technique is looking for partners
A university start-up has developed a unique way to monitor plasma processes (think PECVD, PVD). The technique enables accurate measurement of most relevant process parameters in-situ and real-time without disturbing the process.
The company offers a technical cooperation agreement to industrial partners who would like to test and use this measurement technique. In addition the company is open to investors for a financial agreement.
They are looking for partners especially in photonics and optics (optical coatings), who are interested to enhance their plasma processes with this unique new monitoring method.
- The problem with these surface-activating plasma processes is that they have to be carried out in difficultly accessible vacuum chambers/reactors. Which makes proper monitoring of these processes quit difficult.
- Mostly the process parameters are monitored through sensors fitted to the wall of the reactor, which is only in the periphery of the actual plasma process and therefore less accurate.
- The German start-up developed a probe that can be flexibly positioned within the reactor.
- This enables the probe to be placed within the actual plasma without disturbing the process. A more accurate process monitoring is currently not available.
- Their technology has been extensively tested and fine-tuned over the last years and is now ready to be used in industrial processes.
- For this purpose we are looking for partners who want to test this probe and see how it can optimise their own plasma processes.
Looking for companies in Israel interested in this technology and that are curious and want to know more about it!
קבלת פרטי הקשר של החברה בכפוף להסכמת החברה בלבד
